Title: Behind Every IC: The Importance of Mask Process Correction
Date and Time: 19th August 2026 & 3:00PM
Venue: SV Narasaiah Auditorium, IAP Department
Abstract for the talk:
Modern semiconductor manufacturing relies on transferring circuit patterns from a design layout onto silicon wafers through a series of complex patterning processes. While the wafer determines the performance of the final chip, its features originate from masks that must be fabricated with extreme precision. Any deviations introduced during mask manufacturing can ultimately impact wafer quality and device performance. This talk introduces the connection between wafer pattern fidelity and mask fabrication, highlighting the role of Mask Process Correction (MPC) in compensating for distortions caused by electron-beam scattering, resist and etch processes. Drawing from industrial experience at Siemens EDA, the session will explore how modeling, simulation, and computational techniques enable accurate mask manufacturing for advanced semiconductor technologies.
About the speaker:
Dr. Alwar Samy Ramasamy earned his Bachelor’s degree in Mechanical Engineering from Anna University, Chennai, in 2011. He began his career in the Research and Development division of WABCO (Westinghouse Air Brake Company), where he worked on air brake systems for heavy vehicles for three years. He later pursued his doctoral studies at the Indian Institute of Technology Madras (IIT Madras), where his research focused on capillary flows arising from the interaction between microdroplets and flexible membranes, contributing to alternatives to lithography-based microfluidic devices. Following his Ph.D., he was awarded the National Post-Doctoral Fellowship and carried out research on soft photonics and electronic devices along with Dr. Tapajyoti Dasgupta in the Department of Instrumentation and Applied Physics at the Indian Institute of Science (IISc), Bengaluru. Dr. Alwar Samy currently works as an Advanced Product Engineer at Siemens EDA, where he works in the field of computational lithography.
If anyone would like to join the session online, please find the link provided below.
https://teams.microsoft.com/meet/478831517012116?p=y0a9zHMXnAdu5QriT9
Refreshments will be provided after the seminar talk.
ALL ARE WELCOME.
Dr. Alwar Samy Ramasamy earned his Bachelor’s degree in Mechanical Engineering from Anna University, Chennai, in 2011. He began his career in the Research and Development division of WABCO (Westinghouse Air Brake Company), where he worked on air brake systems for heavy vehicles for three years. He later pursued his doctoral studies at the Indian Institute of Technology Madras (IIT Madras), where his research focused on capillary flows arising from the interaction between microdroplets and flexible membranes, contributing to alternatives to lithography-based microfluidic devices. Following his Ph.D., he was awarded the National Post-Doctoral Fellowship and carried out research on soft photonics and electronic devices along with Dr. Tapajyoti Dasgupta in the Department of Instrumentation and Applied Physics at the Indian Institute of Science (IISc), Bengaluru. Dr. Alwar Samy currently works as an Advanced Product Engineer at Siemens EDA, where he works in the field of computational lithography.