Present Members

Dr.Tapajyoti Das Gupta
Renu Raman Sahu
  • Harnessing fluid instabilities for fabrication of Ga based plasmonic nanostructures.
  •  Nanoscale fabrication, characterization and analysis of novel material for photonic applications.
  • Website:renuraman.in
Arvind Yelashetty
  • Developing an indigenous 3D printer capable of printing submicron features
  • Mentoring students and interns of LANSPE on various topics in metasurface based lenses.
Manjarik Mrinal
  • Developing an indigenous 3D printer capable of printing submicron features.
Sivakumar
Santanu Mandal
  • Theoretical and computational development of far-field super resolution imaging, and experimental implementation of super resolution Meta-lens.
  • Designing Metasurface based dynamically tunable various optical components like notch filters.
Ramnishanth
  • Development of Achromatic,wide angled Metalenses and super-oscilatory metalenses for imaging purposes.
  • Optimizing metalens design using various computational methods
Srijitha Biswas
  • Theoretical and Mathematical modeling of thin film surface morphologies on soft substrates and its implementation in flexible photonic devices.
  • Design and fabrication of dynamically tunable and flexible photonic devices like notch filters.
Poulami Das
  • Development of nanoimprint lithography (NIL) techniques for scalable manufacturing of high-aspect-ratio nanostructures in meta-surface applications.

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Shubham Meena
  • Developing compact Metalens based optical lithography system
WhatsApp Image 2025-03-07 at 12.14.31
Anagha
  • Synthesizing Nanocomposite-based Resins
Omkar Shinkre
  • Influence of nanoscale Gate patterning on Thin Film Transistor parameters.
WhatsApp Image 2025-03-07 at 18.10.39
Ritvik R
  • Polymer based Photonic Integrated Circuit, Fabrication and Characterization.
  • Master of Quantum, Lives in superposition.
Sanshrey
  •  Automation and control for submicron 3D printer and DWL system workflows for precise lithography based fabrication.  
  • Investigating materials and their optimized process flows for nanoscale feature stability and defect control.
Govinda